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Magnetoresistance of galfenol-based magnetic tunnel junction
Benoit Gobaut, G. Vinai, C. Castán-Guerrero, D. Krizmancic, H. Rafaqat, S. Roddaro, G. Rossi, G. Panaccione, Mahmoud Eddrief, Massimiliano Marangolo, P. Torelli

Magnetoresistance of galfenol-based magnetic tunnel junction

Science & Mathematics Published 2015 Verification Pending

Overview & Synopsis

The manipulation of ferromagnetic layer magnetization via electrical pulse is driving an intense research due to the important applications that this result will have on memory devices and sensors. In this study we realized a magnetotunnel junction in which one layer is made of Galfenol (Fe1-xGax) which possesses one of the highest magnetostrictive coefficient known. The multilayer stack has been grown by molecular beam epitaxy and e-beam evaporation. Optical lithography and physical etching have been combined to obtain 20x20 micron sized pillars. The obtained structures show tunneling conductivity across the junction and a tunnel magnetoresistance(TMR) effect of up to 11.5% in amplitude.

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Document Information

Document Title Magnetoresistance of galfenol-based magnetic tunnel junction
Author / Organization Benoit Gobaut, G. Vinai, C. Castán-Guerrero, D. Krizmancic, H. Rafaqat, S. Roddaro, G. Rossi, G. Panaccione, Mahmoud Eddrief, Massimiliano Marangolo, P. Torelli
Subject & Discipline Multidisciplinary Academic Open Research
Categories Science & Mathematics
Publication Year 2015
License / Rights Open Access / Creative Commons
Resource Verification Listed PDF (Verification Pending)
Original Host Website HAL Open Science (hal.science)
File Format application/pdf (Portable Document Format)
Language EN
Catalog ID DOC-89887
Original Source Link Visit Source Page on hal.science »