Self-excited instability occurring during the nanoparticle formation in an Ar-SiH4 low pressure radio frequency plasma

Overview & Synopsis

An experimental investigation of an instability occurring during dust nanoparticle formation is presented in this paper. The present study has been performed in radiofrequency low pressure plasma in an argon-silane mixture. The formation and growth of nanoparticles is followed, thanks to the analysis of the amplitude of the third harmonics (40.68 MHz) of the discharge current and the self-bias voltage (Vdc). In some cases, at the end of the accumulation phase of the nanocrystallites an instability occurs. It seems to be an attachment induced ionization instability as observed in electronegative plasmas. A detailed study of the influence of different operating conditions (injected power, gas temperature, and silane flow rate) on this instability behavior and frequencies is presented. The paper concludes by examining a very particular case of the instability.