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Etching of iron and iron–chromium alloys using ICP-RIE chlorine plasma
Author / Organization: Guillaume Le Dain, Feriel Laourine, Stéphane Guilet, Thierry Czerwiec, Grégory Marcos, Cédric Noel, Gérard Henrion, Christophe Cardinaud, Aurélie Girard, Ahmed Rhallabi
| File Format | PDF (Portable Document Format) |
|---|---|
| Publication Year | 2021 |
| Source Host |
HAL Open Science
(hal.science)
|
| License / Terms | Open Access / Creative Commons |
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