Deposition and Properties of Thin PECVD Carbon Films After Rapid Thermal Annealing
Overview & Synopsis
In this work the properties of PECVD-carbon films before and after Rapid Thermal Annealing (RTA) are presented. The thickness of the investigated films is in the range 50 - 6000Å. The layers are annealed at 1400°C for different times of 1 s to 3 min in vacuum 5 x 10-5 Torr. Raman investigation has been performed before and after annealing.
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Document Information
| Document Title | Deposition and Properties of Thin PECVD Carbon Films After Rapid Thermal Annealing |
|---|---|
| Author / Organization | G. Beshkov, D. Dimitrov, S. Georgiev, T. Dimitrova |
| Subject & Discipline | Multidisciplinary Academic Open Research |
| Categories | Science & Mathematics |
| Publication Year | 1995 |
| License / Rights | Open Access / Creative Commons |
| Resource Verification | Listed PDF (Verification Pending) |
| Original Host Website |
HAL Open Science
(hal.science)
|
| File Format | application/pdf (Portable Document Format) |
| Language | EN |
| Catalog ID | DOC-20540 |
| Original Source Link | Visit Source Page on hal.science » |