PLASMA CVD USING ORGANOMETALLIC COMPOUNDS
Overview & Synopsis
About 50 organometallic compounds have been tested as precursors in the plasma-enhanced chemical vapour deposition (PECVD) of metallic and oxidic films. The classes of compounds which are best suited for the deposition are described. Experimental techniques and problems are discussed. This paper besides briefly reviewing some of our earlier work, focusses on recent, unpublished.
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Document Information
| Document Title | PLASMA CVD USING ORGANOMETALLIC COMPOUNDS |
|---|---|
| Author / Organization | H. Suhr, J. Bald, L. Deutschmann, A. Etspüler, E. Feurer, H. Grünwald, C. Haag, H. Holzschuh, C. Oehr, S. Reich, R. Schmid, I. Traus, B. Waimer, A. Weber, H. Wendel |
| Subject & Discipline | Multidisciplinary Academic Open Research |
| Categories | Science & Mathematics |
| Publication Year | 1989 |
| License / Rights | Open Access / Creative Commons |
| Resource Verification | Listed PDF (Verification Pending) |
| Original Host Website |
HAL Open Science
(hal.science)
|
| File Format | application/pdf (Portable Document Format) |
| Language | EN |
| Catalog ID | DOC-183563 |
| Original Source Link | Visit Source Page on hal.science » |