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Efficient physical-thermal model for thermal effects in AlGaN/GaN high electron mobility transistors
Michel Rousseau, A. Soltani, Jean-Claude de Jaeger

Efficient physical-thermal model for thermal effects in AlGaN/GaN high electron mobility transistors

Science & Mathematics Published 2012 Verification Pending

Overview & Synopsis

This letter describes the thermal behavior of AlGaN/GaN high electron mobility transistors on different substrates thanks to a fully consistent physical-thermal model. Self-heating explains the drastic reduction in the current flowing from drain to source. It is shown that, in order to keep the material from significantly degrading at the gate exit, the maximum dissipated power must be limited to 7 W/mm, 13 W/mm, and 38 W/mm for silicon, silicon carbide, and diamond substrates, respectively. These results have been validated from experimental thermal measurements.

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Document Information

Document Title Efficient physical-thermal model for thermal effects in AlGaN/GaN high electron mobility transistors
Author / Organization Michel Rousseau, A. Soltani, Jean-Claude de Jaeger
Subject & Discipline Multidisciplinary Academic Open Research
Categories Science & Mathematics
Publication Year 2012
License / Rights Open Access / Creative Commons
Resource Verification Listed PDF (Verification Pending)
Original Host Website HAL Open Science (hal.science)
File Format application/pdf (Portable Document Format)
Language EN
Catalog ID DOC-162743
Original Source Link Visit Source Page on hal.science »