Colloidal lithography for correlated disorder light-trapping structures.
Overview & Synopsis
We demonstrate that, using colloidal lithography with carboxyl-functionalized polystyrene particles, we can control the correlations in the particle arrangement and tune the pseudo period between 260 and 980 nm. Such correlated disordered nanostructures show promise in enhancing light scattering out side the escape cone and effectively trapping light in solar cells.
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hal.science)
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Document Information
| Document Title | Colloidal lithography for correlated disorder light-trapping structures. |
|---|---|
| Author / Organization | Laura de Almeida, Jean Baptiste Doucet, Mathieu Arribat, Guilhem Almuneau, Stéphane Collin, Inès Revol |
| Subject & Discipline | Multidisciplinary Academic Open Research |
| Categories | Science & Mathematics |
| Publication Year | 2026 |
| License / Rights | Open Access / Creative Commons |
| Resource Verification | Listed PDF (Verification Pending) |
| Original Host Website |
HAL Open Science
(hal.science)
|
| File Format | application/pdf (Portable Document Format) |
| Language | EN |
| Catalog ID | DOC-148394 |
| Original Source Link | Visit Source Page on hal.science » |