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Preparation and characterization of MOCVD-fabricated TiO2: thin films deposited on titanium for biomedical applications
Simona Popescu, Ioana Demetrescu, Alain Gleizes

Preparation and characterization of MOCVD-fabricated TiO2: thin films deposited on titanium for biomedical applications

Science & Mathematics Published 2007 Verification Pending

Overview & Synopsis

Titanium oxide (TiO2) thin films devoted to biomedical application were obtained by the chemical vapour deposition method. The films were deposited on titanium substrate using a low-pressure reactor with various precursor molar fractions and deposition temperatures. The influence of these parameters on film properties xas studied by using electron microscopy images, roughness measuring, X-ray diffraction, contact angle measuring and cyclic polarisation tests.

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Document Information

Document Title Preparation and characterization of MOCVD-fabricated TiO2: thin films deposited on titanium for biomedical applications
Author / Organization Simona Popescu, Ioana Demetrescu, Alain Gleizes
Subject & Discipline Multidisciplinary Academic Open Research
Categories Science & Mathematics
Publication Year 2007
License / Rights Open Access / Creative Commons
Resource Verification Listed PDF (Verification Pending)
Original Host Website HAL Open Science (hal.science)
File Format application/pdf (Portable Document Format)
Language EN
Catalog ID DOC-118206
Original Source Link Visit Source Page on hal.science »