Effect of gate-source bias voltage and gate-drain leakage current on the short-circuit performance of FTO-type SiC power MOSFETs
Overview & Synopsis
As a result of short-circuit (SC) stress tests, few commercial 1.2 kV SiC MOSFETs feature fail-to-open (FTO) behavior, that is, a permanent short-circuit between gate and source terminals, even at drain-source bias voltages as high as 600 V. Such devices are very interesting from an application point of view, since such failure mode enables implementation of hoppinghome functionality at a nominal operational voltage and have thus been investigated in depth. This work delivers incremental and complementary understanding on the very timely and highly application-relevant topic of short-circuit withstand capability, aging and failure-mode of SiC power MOSFETs, pointing out new effects and dependence of the degradation state on the bias conditions during test.
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Document Information
| Document Title | Effect of gate-source bias voltage and gate-drain leakage current on the short-circuit performance of FTO-type SiC power MOSFETs |
|---|---|
| Author / Organization | Frédéric Richardeau, A. Borghese, A. Castellazzi, A. Irace, V. Chazal, G. Guibaud |
| Subject & Discipline | Multidisciplinary Academic Open Research |
| Categories | Science & Mathematics |
| Publication Year | 2021 |
| License / Rights | Open Access / Creative Commons |
| Resource Verification | Listed PDF (Verification Pending) |
| Original Host Website |
HAL Open Science
(hal.science)
|
| File Format | application/pdf (Portable Document Format) |
| Language | EN |
| Catalog ID | DOC-110805 |
| Original Source Link | Visit Source Page on hal.science » |