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Effect of gate-source bias voltage and gate-drain leakage current on the short-circuit performance of FTO-type SiC power MOSFETs
Frédéric Richardeau, A. Borghese, A. Castellazzi, A. Irace, V. Chazal, G. Guibaud

Effect of gate-source bias voltage and gate-drain leakage current on the short-circuit performance of FTO-type SiC power MOSFETs

Science & Mathematics Published 2021 Verification Pending

Overview & Synopsis

As a result of short-circuit (SC) stress tests, few commercial 1.2 kV SiC MOSFETs feature fail-to-open (FTO) behavior, that is, a permanent short-circuit between gate and source terminals, even at drain-source bias voltages as high as 600 V. Such devices are very interesting from an application point of view, since such failure mode enables implementation of hoppinghome functionality at a nominal operational voltage and have thus been investigated in depth. This work delivers incremental and complementary understanding on the very timely and highly application-relevant topic of short-circuit withstand capability, aging and failure-mode of SiC power MOSFETs, pointing out new effects and dependence of the degradation state on the bias conditions during test.

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Document Information

Document Title Effect of gate-source bias voltage and gate-drain leakage current on the short-circuit performance of FTO-type SiC power MOSFETs
Author / Organization Frédéric Richardeau, A. Borghese, A. Castellazzi, A. Irace, V. Chazal, G. Guibaud
Subject & Discipline Multidisciplinary Academic Open Research
Categories Science & Mathematics
Publication Year 2021
License / Rights Open Access / Creative Commons
Resource Verification Listed PDF (Verification Pending)
Original Host Website HAL Open Science (hal.science)
File Format application/pdf (Portable Document Format)
Language EN
Catalog ID DOC-110805
Original Source Link Visit Source Page on hal.science »