Platinum Protective Coatings Processed by Organometallic CVD

Overview & Synopsis

Platinum deposition by OMCVD from (Me3(MeCp)Pt) for protective coatings applications has been studied. Films grown at 473 K and 573 K on a Ti6242 alloy show a continuous microstructure, with growth rate of 19 nm · min−1 and 2.5 nm · min−1, respectively. No preferential orientation is observed at the latter temperature, while at 473 K films are textured following (111) orientation. The plot of thicknesses versus time at 473 K reveals an induction period followed by an autocatalytic growth. Platinum acts as a catalyst for the precursor decomposition when clusters reach critical size. At 573 K desorption of precursor from the surface prevents autocatalytic behaviour to appear resulting in decrease of the growth rate.