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LUMINESCENCE IN PLASMA DEPOSITED AMORPHOUS SixC1-x ALLOYS
R. Sussmann, E. Lauder

LUMINESCENCE IN PLASMA DEPOSITED AMORPHOUS SixC1-x ALLOYS

Author / Organization:
Science & Mathematics Published 1981 Verification Pending

Overview & Synopsis

Results are presented on the composition and temperature dependence of the luminescence in plasma deposited amorphous SixC1-x alloys using films of composition ranging from pure Si to 90% C in the 77 K to 450 K temperature range. There is evidence to suggest that the radiative recombination rate increases by over a factor of 103 from pure Si to C rich films. This increase is shown to be also consistent with the composition dependence of the quantum efficiency. These results are discussed in terms of a radiative tunnelling model.

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Document Information

Document Title LUMINESCENCE IN PLASMA DEPOSITED AMORPHOUS SixC1-x ALLOYS
Author / Organization R. Sussmann, E. Lauder
Subject & Discipline Multidisciplinary Academic Open Research
Categories Science & Mathematics
Publication Year 1981
License / Rights Open Access / Creative Commons
Resource Verification Listed PDF (Verification Pending)
Original Host Website HAL Open Science (hal.science)
File Format application/pdf (Portable Document Format)
Language EN
Catalog ID DOC-109062
Original Source Link Visit Source Page on hal.science »