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Nitrogen Plasma Instabilities and the Growth of Silicon Nitride by Electron Cyclotron Resonance Microwave Plasma Chemical Vapor Deposition
Pool, F. S.

Nitrogen Plasma Instabilities and the Growth of Silicon Nitride by Electron Cyclotron Resonance Microwave Plasma Chemical Vapor Deposition

Author / Organization:
Aerospace & Aviation Published 1996 Verification Pending
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Indexed from repository: NASA Technical Reports Server (ntrs.nasa.gov)

Document Information

Document Title Nitrogen Plasma Instabilities and the Growth of Silicon Nitride by Electron Cyclotron Resonance Microwave Plasma Chemical Vapor Deposition
Author / Organization Pool, F. S.
Subject & Discipline Other
Categories Aerospace & Aviation
Publication Year 1996
License / Rights Public Domain / NASA STI Open Access
Resource Verification Listed PDF (Verification Pending)
Original Host Website NASA Technical Reports Server (ntrs.nasa.gov)
File Format application/pdf (Portable Document Format)
Language EN
Catalog ID DOC-65436
Original Source Link Visit Source Page on ntrs.nasa.gov »