RFEA-Derived Ion-Energy Descriptors for Preliminary Process-Window Evaluation in Dual-Beam Soft Plasma Etching of Organic Semiconductor Films.
Overview & Synopsis
Open access biomedical research article published in Micromachines (Basel).
Indexed from repository: PubMed Central
(
pmc.ncbi.nlm.nih.gov)
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Document Information
| Document Title | RFEA-Derived Ion-Energy Descriptors for Preliminary Process-Window Evaluation in Dual-Beam Soft Plasma Etching of Organic Semiconductor Films. |
|---|---|
| Author / Organization | Gao R, Dai M, Zou X, Wang Y |
| Subject & Discipline | Micromachines (Basel) |
| Categories | Medicine & Health |
| Publication Year | 2026 |
| License / Rights | Open Access / Creative Commons |
| Resource Verification | Listed PDF (Verification Pending) |
| Original Host Website |
PubMed Central
(pmc.ncbi.nlm.nih.gov)
|
| File Format | application/pdf (Portable Document Format) |
| Language | EN |
| Catalog ID | DOC-148659 |
| Original Source Link | Visit Source Page on pmc.ncbi.nlm.nih.gov » |