Home » Authors » T. Rasoanarivo, C. Mannequin, I. Braems, E. Sala, F. Roqueta, M. Boufnichel, A. Rhallabi

T. Rasoanarivo, C. Mannequin, I. Braems, E. Sala, F. Roqueta, M. Boufnichel, A. Rhallabi

Public reference bibliography and cataloged PDF materials authored or published by T. Rasoanarivo, C. Mannequin, I. Braems, E. Sala, F. Roqueta, M. Boufnichel, A. Rhallabi.

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Multiscale modeling of gallium nitride atomic layer etching in chlorinated plasmas: A combined dynamic global model, ab initio , and kinetic Monte Carlo approach

Year: 2026 • Source: hal.science • Listed PDF

GaN is a key material in microelectronics that requires precise etching to meet technological demands. Plasma Atomic layer etching (ALE) is a promising process to achieve a defectless surface. However, the plasma/surface...